Archive for 2011

reticule

are more well-used in people's life. The reticule in wholesale city are so lovely that many girls fascinated with them. Let alone the cute appearance. They are the just right containers in most users' minds despite the small capacity. Their metal belts can be put into the handbags or taken off directly when you want to hold them. However, office females or those busy ones would prefer to the pocket-insidelarge reticule  are also very convenient for you to take the notebooks, files, books, cosmetics and other things. Thanks to those large handbags, holders look serious and easy-going, and they always match to the clothes you wear.

Handbags Elite

reticle

A reticle (or reticule) is a net of fine lines or fibers in the eyepiece of a sighting device, such as a telescope, a telescopic sight, a microscope, or the screen of an oscilloscope. The word reticle comes from the Latin "reticulum," meaning "net." Today, engraved lines or embedded fibers may be replaced by a computer-generated image superimposed on a screen or eyepiece. The term graticule is the synonymous term from French, it comes from the Latin craticula for gridiron. Both may be used to describe any set of lines used for optical measurement, but in modern use the term reticle is most commonly used for gunsights and such, while graticule is more widely used for the covers of oscilloscopes and similar roles.
There are many variations of reticles; this article concerns itself mainly with a simple reticle: crosshairs. Crosshairs are most commonly represented as intersecting lines in the shape of a cross, "+", though many variations exist, including dots, posts, circles, scales, chevrons, or a combination of these. Most commonly associated with telescopic sights for aiming firearms, crosshairs are also common in optical instruments used for astronomy and surveying, and are also popular in graphical user interfaces as a precision pointer. The reticle is said to have been invented by Robert Hooke, and dates to the 17th century.[1]

reticules

"All young ladies accomplished! My dear Charles, what do you mean?"
"Yes, all of them, I think. They all paint tables, cover screens, and net purses. I scarcely know anyone who cannot do all this, and I am sure I never heard of a young lady spoken of for the first time, without being informed that she was very accomplished.
Pride and Prejudice, chapter 8

Because the straight lines of Regency gowns did not provide room for pockets, women were forced to carry necessary items in small drawstring bags called reticules. Precursor to today's purse, the reticule provided a place to store important things (small parcels, spare change, the ever-present handkerchief, a small mirror, perhaps a snuffbox [all the rage at the time] or powder, smelling salts, and a love-letter or two) close at hand.

Reticules could be made of fabric coordinating with a particular gown or ensemble; some had papier mache bases and fabric tops. Toward the end of the Regency, they began using clasps as an alternative to the drawstring. Reticules frequently featured beading or embroidery and could be quite elaborate.

One other type of purse that was popular, was the "Miser's" or "Stocking" purse. Shaped like a tube (or sock) it had an opening in the center. When held in the middle you had two pockets in which to hold spare change. Rings slid down from the center to keep each side closed. Making purses was a popular pastime, as they could be knitted, netted or crocheted.




Visit the Boutique for a custom made Reticule

Tas Gucci 908

Tas Gucci 908

Tas Gucci 908-Biru Tas Gucci 908-Coklat Tas Gucci 908-Hitam Tas Gucci 908-Pink
(klik foto untuk memperbesar)
Kode Produk: Tas Gucci 908 (KW 1)
Warna: Biru, Coklat, Hitam, Pink
Dimensi: 32 x 25 x 11 (panjang x tinggi x tebal)
Info: Bahan kanvas mix kulit sintetis, ada sertifikat
Harga: Rp. 295.000

reticule definition

Photomask

From Wikipedia, the free encyclopedia
A photomask.
A schematic illustration of a photomask (top) and an integrated circuit created using that mask (bottom).
A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography.

Contents

Overview

An actual photomask. The thicker features are the integrated circuit which is desired to be printed on the wafer. The thinner features are assists which do not print themselves but help the integrated circuit print better out-of-focus. The zig-zag appearance of the photomask is because optical proximity correction was applied to it to make it print better.
Lithographic photomasks are typically transparent fused silica blanks covered with a pattern defined with a chrome metal absorbing film. Photomasks are used at wavelengths of 365 nm, 248 nm, and 193 nm. Photomasks have also been developed for other forms of radiation such as 157 nm, 13.5 nm (EUV), X-ray and electrons and ions, but these require entirely new materials for the substrate and the pattern film.
A set of photomasks, each defining a pattern layer in integrated circuit fabrication, is fed into a photolithography stepper or scanner and individually selected for exposure. In double patterning techniques, a photomask would correspond to a subset of the layer pattern.
In photolithography for the mass production of integrated circuit devices, the more correct term is usually photoreticle or simply reticle. In the case of a photomask, there is a one-to-one correspondence between the mask pattern and the wafer pattern. This was the standard for the 1:1 mask aligners that were succeeded by steppers and scanners with reduction optics. As used in steppers and scanners, the reticle commonly contains only one layer of the chip. (However, some photolithography fabs utilize reticles with more than one layer patterned onto the same mask). The pattern is projected and shrunk by four or five times onto the wafer surface. To achieve complete wafer coverage, the wafer is repeatedly 'stepped' from position to position under the optical column until full exposure is achieved.
Features 150 nm or below in size generally require phase-shifting to enhance the image quality to acceptable values. This can be achieved in many ways, but the two most common methods are to use an attenuated phase-shifting background film on the mask to increase the contrast of small intensity peaks, or to etch the exposed quartz so that the edge between the etched and unetched areas can be used to image nearly zero intensity. In the second case, unwanted edges would need to be trimmed out with another exposure. The former method is attenuated phase-shifting, and is often considered a weak enhancement, requiring special illumination for the most enhancement, while the latter method is known as alternating-aperture phase-shifting, and is the most popular strong enhancement technique.
As leading-edge semiconductor features shrink, photomask features which are 4× larger must inevitably shrink as well. This could pose challenges as the absorber film will need to become thinner, and hence less opaque.[1] A recent study by IMEC has found that thinner absorbers degrade image contrast and hence contribute to line-edge roughness, using state-of-the-art photolithography tools.[2] One possibility is to eliminate absorbers altogether and use 'chromeless' masks, relying solely on phase-shifting for imaging.
The emergence of immersion lithography has a strong impact on photomask requirements. The commonly used attenuated phase-shifting mask is more sensitive to the higher incidence angles applied in "hyper-NA" lithography, due to the longer optical path through the patterned film.[3]

Mask Error Enhancement Factor

Leading edge photomasks contain (pre-corrected) images of the final chip patterns magnified by 4x. This magnification factor has been a key benefit in reducing pattern sensitivity to imaging errors. However, as features continue to shrink, two trends come into play: 1) the mask error factor begins to exceed 1, i.e., the dimension error on the wafer may be more than 1/4 the dimension error on the mask,[4] and 2) the mask feature is becoming smaller, and the dimension tolerance is approaching a few nanometers. As an example, a 25 nm wafer pattern should correspond to a 100 nm mask pattern, but the wafer tolerance could be 1.25 nm (5% spec) which translates into 5 nm on the photomask. The variation of electron beam scattering in directly writing the photomask pattern can easily well exceed this.[

Tas Fendi 1107

Tas Fendi 1107

Tas Fendi 1107-Biru Tas Fendi 1107-Hijau Tas Fendi 1107-Orange Tas Fendi 1107-Pink Tas Fendi 1107-Ungu
(klik foto untuk memperbesar)
Kode Produk: Tas Fendi 1107 (KW 1)
Warna: Biru, Hijau, Kuning, Pink, Ungu
Dimensi: 43 x 35 x 14 (panjang x tinggi x tebal)
Info: Bahan kanvas mix kulit sintetis
Harga: Rp. 335.000

Tas Burberry 1106-Apricot

Tas Burberry 1106

Tas Burberry 1106-Coklat Muda Tas Burberry 1106-Coklat Tua Tas Burberry 1106-Hitam
(klik foto untuk memperbesar)
Kode Produk: Tas Burberry 1106 (KW 2)
Warna: Apricot, Coklat Muda, Coklat Tua, Hitam
Dimensi: 38 x 32 x 15 (panjang x tinggi x tebal)
Info: Bahan kanvas mix kulit sintetis
Harga: Rp. 295.000

Tas Bottega Veneta 6155-9

Tas Bottega Veneta 6155-9

Tas Bottega Veneta 61559-Coklat Tas Bottega Veneta 61559-Hitam Tas Bottega Veneta 61559-Silver Tas Bottega Veneta 61559-Tembaga
(klik foto untuk memperbesar)
Kode Produk: Tas Bottega Veneta 6155-9 (KW 1)
Warna: Coklat, Hitam, Silver, Tembaga
Dimensi: 42 x 27 x 14 (panjang x tinggi x tebal)
Info: Bahan kulit sintetis
Harga: Rp. 315.000 >>> SALE >>> Rp. 205.000

Tas Sunny Girl B 1103

Tas Sunny Girl B 1103

Tas Sunny Girl B 1103-Hitam Tas Sunny Girl B 1103-Merah
(klik foto untuk memperbesar)
Kode Produk: Tas Sunny Girl B 1103 (KW 1)
Warna: Hitam, Merah
Dimensi: 32 x 27 x 10 (panjang x tinggi x tebal)
Info: Bahan polyester/nylon, ada tali panjang
Harga: Rp. 245.000

Nuno Felt






















































































Sandra K. has now finished working on the piece of nuno felt she made at the September meeting. The muslin was dyed sea greens, purples and blues and it was going to be an undersea picture. However after the felt was worked vigorously it took on the shape of a dress so it was turned into a" mermaid's dress"!!!

Embellisher Work

Maureen has been on an embellisher course at Alston Hall where she made this beautiful landscape with crimson poppies.
She also completed her shoe from the November meeting with a flower made in the same way as the poppies.
It has made me think that I need an embellisher for my birthday!!!!







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December Meeting 2011 Talk by Fobbles

Our meeting started with a talk by Beverley Trembath from Fobbles on how she set up the shop,found premises and the stock she now carries. It was a very interesting and amusing talk. She brought items for us to purchase so we could treat ourselves to some early Christmas presents!





































Our Christmas competition was to make a calendar. Anne was voted the winner for the pretty circular calendar in the top left corner. Well done Anne!
























As this was our last meeting before Christmas we also had our Jacob' Join and you can see us all enjoying the food and the Christmas atmosphere. Thank you everyone for the donations of food. Hope you all have a Happy Christmas and a peaceful New Year .







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Knitting and Stitching Show Harrogate November 2011

On Friday 25th November we had our annual trip to the Knitting and Stitching Show at Harrogate. We went by coach with practically everyone clutching their shopping lists and their empty bags ready to be filled!
The venue was very crowded with like minded people looking for that special something they cannot buy at home and scanning the displays for inspiration for their next project.
The displays were beautiful and the colours and textures everywhere were mind boggling. My particular favourite display was the Prestonpans Tapestry which was far longer than the Bayeux Tapestry. There are three pictures below.
By the end of the afternoon we had all had a good day and our bags were full with goodies!









































































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